Po-Wei Liu

Title: Po-Wei Liu: Innovator in Semiconductor Technology

Introduction

Po-Wei Liu is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative methods for manufacturing semiconductor devices and improving the performance of CMOS transistors.

Latest Patents

One of Liu's latest patents is titled "Semiconductor device and method for manufacturing the same." This patent describes a method for manufacturing a semiconductor device that involves forming a gate structure on a substrate, followed by a series of dopant implantations and the formation of spacers. The process culminates in a solid-phase epitaxy annealing step to create source and drain regions made of a semiconductor compound solid-phase epitaxial layer adjacent to the gate structure.

Another notable patent is the "Method of fabricating CMOS transistor." This invention outlines a technique for fabricating a CMOS transistor that includes forming strained channels using re-crystallized amorphous polysilicon. The method enhances charge carrier mobility in the transistor, thereby improving its overall performance.

Career Highlights

Po-Wei Liu is currently employed at United Microelectronics Corporation, where he continues to advance semiconductor technology. His innovative approaches have positioned him as a key figure in the industry, contributing to the development of more efficient and effective semiconductor devices.

Collaborations

Liu has collaborated with several talented individuals in his field, including Cheng-Tzung Tsai and Chen-Hua Tsai. These collaborations have further enriched his work and contributed to the success of his inventions.

Conclusion

Po-Wei Liu is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His innovative patents and contributions continue to shape the future of semiconductor manufacturing.