Po-Sheng Lee

Title: Po-Sheng Lee: Innovator in Semiconductor Technology

Introduction

Po-Sheng Lee is a notable inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of dynamic random access memory (DRAM) fabrication methods. With a total of 2 patents, his work has had a considerable impact on the industry.

Latest Patents

One of Po-Sheng Lee's latest patents is a method of fabricating a dynamic random access memory. This innovative method involves providing a substrate that includes both a memory device area and a peripheral device area. In the memory device area, an isolation structure and a capacitor are formed, while in the peripheral device area, an isolation structure and a well are established. The process includes forming a first oxide layer on the peripheral device area and a passing gate isolation structure on the memory device area simultaneously. Additionally, a second oxide layer is created on the memory device area, followed by the formation of a first transistor, a passing gate, and a second transistor.

Another significant patent by Lee is a wet cleaning process for semiconductor devices. This process includes at least one first rinse process and a second rinse step. The first rinse step involves rinsing a substrate with deionized water containing CO, followed by draining the water to expose the substrate in a CO atmosphere. The second rinse step also utilizes deionized water containing CO.

Career Highlights

Throughout his career, Po-Sheng Lee has worked with prominent companies in the semiconductor industry, including United Microelectronics Corporation. His expertise in semiconductor technology has positioned him as a valuable asset in the field.

Collaborations

Po-Sheng Lee has collaborated with several professionals in the industry, including Chien-En Hsu and Chih-Nan Liang. These collaborations have contributed to the advancement of semiconductor technologies and innovations.

Conclusion

Po-Sheng Lee's contributions to semiconductor technology, particularly in the area of dynamic random access memory fabrication, highlight his role as an influential inventor. His patents and collaborations reflect his commitment to advancing the field and improving semiconductor processes.