Ping Hung Li

Title: The Innovations of Ping Hung Li

Introduction

Ping Hung Li is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to FinFET devices.

Latest Patents

One of Ping Hung Li's key patents is titled "FinFET device and method of forming the same." This patent describes a method that includes depositing a first conductive material in an opening between a first semiconductor structure and a second semiconductor structure. The first conductive material comprises at least one first void. The method further involves removing a portion of the first conductive material to create a trench, which exposes the at least one first void and is defined by the remaining portion of the first conductive material. Additionally, a second conductive material is deposited in the trench, forming a dummy gate layer alongside the remaining portion of the first conductive material. This innovative approach enhances the performance and efficiency of FinFET devices.

Career Highlights

Ping Hung Li is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing semiconductor technologies, contributing to the company's reputation for innovation and excellence.

Collaborations

Throughout his career, Ping Hung Li has collaborated with esteemed colleagues, including Lun-Kuang Tan and Hui-Ying Lu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Ping Hung Li's contributions to the field of semiconductor technology, particularly through his patent on FinFET devices, highlight his innovative spirit and dedication to advancing the industry. His work continues to influence the development of cutting-edge technologies in the semiconductor sector.