Pin-Hsiu Hsieh

Title: The Innovations of Pin-Hsiu Hsieh

Introduction

Pin-Hsiu Hsieh is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology. With a total of 2 patents, Hsieh's work focuses on innovative methods for fabricating semiconductor devices.

Latest Patents

Hsieh's latest patents include a method of fabricating a semiconductor device. This method involves providing a semiconductor substrate that comprises both a memory region and a logic region. It includes forming a memory gate in or on the memory region, as well as a plurality of first poly-silicon gates surrounding the memory gate. Additionally, it involves forming a plurality of second poly-silicon gates on the logic region simultaneously with the first poly-silicon gates. Another patent details a semiconductor device and a method of fabricating the same. This device includes a semiconductor substrate, a memory cell, and two logic transistors. The first logic transistor is designed to control the operation of the memory cell in response to a memory control signal provided by the second logic transistor.

Career Highlights

Hsieh is currently employed at Nan Ya Technology Corporation, where he continues to advance semiconductor technology. His work has been instrumental in developing efficient methods for semiconductor fabrication.

Collaborations

Some of Hsieh's coworkers include Da-Zen Chuang and Chih-Chung Sun, who contribute to the innovative environment at Nan Ya Technology Corporation.

Conclusion

Pin-Hsiu Hsieh's contributions to semiconductor technology through his patents and work at Nan Ya Technology Corporation highlight his role as a key innovator in the field. His advancements continue to shape the future of semiconductor devices.