Petra Heim

Title: Petra Heim: Innovator in Silicon Semiconductor Technology

Introduction

Petra Heim is a prominent inventor based in Heilbronn, Germany. She has made significant contributions to the field of semiconductor technology, particularly in the manufacturing processes of silicon devices. With a total of 2 patents to her name, her work has had a notable impact on the industry.

Latest Patents

Heim's latest patents include a process for manufacturing a silicon semiconductor device that reduces surface recombination velocity. This innovative process involves forming multiple semiconductor zones on the surface of a silicon wafer while maintaining a temperature below 100°C. The steps include cleaning the surface to remove oxide, drying it with a non-oxidizing gas, and applying a lacquer layer that contains halogen in a concentration of more than 0.1 volume %. This method effectively generates an electrically non-conducting layer, which is crucial for enhancing the performance of silicon devices. Another patent focuses on reducing the surface recombination speed in silicon, which is essential for the production of electronic devices and for various analytical methods to determine silicon purity.

Career Highlights

Petra Heim is currently employed at Temic Telefunken Microelectronic GmbH, where she continues to advance her research and development efforts in semiconductor technology. Her innovative approaches have positioned her as a key figure in her field.

Collaborations

Throughout her career, Heim has collaborated with notable colleagues such as Wolfgang Arndt and Klaus Graff. These partnerships have fostered a collaborative environment that enhances the innovation process.

Conclusion

Petra Heim's contributions to semiconductor technology exemplify her dedication to innovation and excellence. Her patents reflect her expertise and commitment to advancing the field, making her a significant figure in the industry.