Pei-Lin Wu

Title: Pei-Lin Wu: Innovator in Semiconductor Technology

Introduction

Pei-Lin Wu is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on innovative semiconductor device structures that enhance performance and efficiency.

Latest Patents

Among his latest patents, Pei-Lin Wu has developed a semiconductor device structure with a spacer. This invention includes a substrate and a gate stack positioned over the substrate. The structure features a spacer located on the side of the gate stack and a dielectric layer that has a unique configuration with a convex curved sidewall. Another notable patent is the semiconductor device structure with a recessed spacer. This design incorporates a gate stack with varying widths and multiple spacers on opposite sides, optimizing the device's functionality.

Career Highlights

Pei-Lin Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative designs have contributed to advancements in semiconductor technology, making him a valuable asset to his company.

Collaborations

Pei-Lin Wu has collaborated with notable colleagues, including Chun-Sheng Liang and Ming-Heng Tsai. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Pei-Lin Wu's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to shape the future of semiconductor devices, demonstrating the importance of innovation in technology.