San Mateo, CA, United States of America

Paul Vande Voorde

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.2

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2004-2024

Loading Chart...
4 patents (USPTO):Explore Patents

Title: The Innovations of Paul Vande Voorde

Introduction

Paul Vande Voorde is a notable inventor based in San Mateo, California. He holds a total of four patents that showcase his contributions to the field of semiconductor technology. His work has significantly impacted the development of memory devices and resistors.

Latest Patents

One of his latest patents is titled "Method and apparatus for analog floating gate memory cell." This invention describes a floating-node memory device that includes a metal-oxide-semiconductor (MOS) transistor, a tunneling device, and a metal-insulator-metal (MIM) capacitor. The design allows for efficient coupling of various nodes, enhancing the functionality of memory devices. Another significant patent is "Semiconductor diffused resistors with optimized temperature dependence." This patent details ion implanted resistors formed in a crystalline silicon substrate, which exhibit optimized temperature variation, ensuring performance stability across a wide temperature range.

Career Highlights

Throughout his career, Paul Vande Voorde has worked with prominent companies such as Winbond Electronics Corporation and Hewlett-Packard Development Company, L.P. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

Paul has collaborated with talented individuals in the field, including Chun-Mai Liu and Joseph Ku. These partnerships have fostered a creative environment that has led to significant advancements in technology.

Conclusion

Paul Vande Voorde's contributions to the field of semiconductor technology through his patents and collaborations highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future inventors.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…