Hillsboro, OR, United States of America

Paul Nordeen

This inventor holds 2 USPTO granted patents and 6 published patent applications. Top assignee: Intel Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul Nordeen. Retrieved from https://idiyas.com/inventor/paul-nordeen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 9.5

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Innovations of Paul Nordeen in Integrated Circuit Technology

Introduction

Paul Nordeen is an accomplished inventor based in Hillsboro, OR (US). He has made significant contributions to the field of integrated circuit technology, holding a total of 2 patents. His work primarily focuses on advancements in gallium nitride (GaN) devices, which are crucial for modern electronic applications.

Latest Patents

Nordeen's latest patents include innovative designs for gallium nitride (GaN) devices with through-silicon vias. This patent describes an integrated circuit structure that features a layer of gallium and nitrogen positioned above a silicon substrate. The design incorporates a backside structure that includes conductive features and dielectric structures. Additionally, it features a plurality of through-silicon via power bars arranged in a staggered manner, enhancing the efficiency of power distribution within the circuit.

Another notable patent by Nordeen focuses on gallium nitride (GaN) epitaxy on patterned substrates. This invention outlines an integrated circuit structure that includes a material layer of gallium and nitrogen, with fins made of silicon on one side. The device layer on the opposite side contains one or more GaN-based devices, showcasing Nordeen's commitment to advancing semiconductor technology.

Career Highlights

Paul Nordeen is currently employed at Intel Corporation, where he continues to push the boundaries of integrated circuit technology. His work has been instrumental in developing cutting-edge solutions that enhance the performance and efficiency of electronic devices.

Collaborations

Throughout his career, Nordeen has collaborated with talented individuals such as Pratik Koirala and Han Wui. These partnerships have fostered innovation and contributed to the successful development of his patented technologies.

Conclusion

Paul Nordeen's contributions to integrated circuit technology through his patents on gallium nitride devices exemplify his expertise and dedication to innovation. His work at Intel Corporation continues to influence the future of electronics, making significant strides in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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