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For the Inventor, By the Inventor

Brewster, NY, United States of America

Paul F Petric

This inventor holds 20 USPTO granted patents, primarily in Electron Beam Lithography. Top assignees: International Business Machines Corporation, Kla Tencor Corporation, Kla-Tencor Technologies Corporation. Active years: 1992-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul F Petric. Retrieved from https://idiyas.com/inventor/paul-f-petric

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20

% Patents Active = 85.0

Average Co-Inventor Count = 2.2

ph-index = 8

Forward Citations = 168(Granted Patents)


Location History:

  • Brewster, NY (US) (1992 - 2000)
  • Pleasanton, CA (US) (2001 - 2017)

Company Filing History:

goldMedal12 out of 166,351 
 
International Business Machines Corporation
 patents
silverMedal7 out of 1,787 
 
Kla Tencor Corporation
 patents
bronzeMedal1 out of 641 
 
Kla-Tencor Technologies Corporation
 patents

Years Active: 1992-2017

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Areas of Expertise:
Electron Beam Lithography
High-Voltage Electron Gun
Nano-Metrology
Projection Lithography
Charged Particle Lithography
Surface Charge Control
Dynamic Pattern Generator
Electron Microscope Assembly
Reflective Electron Patterning
Curvilinear Axis Set-Up
Deflection Yoke
Stigmator
20 patents (USPTO):Explore Patents
1. 9715995 - Apparatus and methods for electron beam lithography using array cathode (2017-07-25),
2. 9355818 - Reflection electron beam projection lithography using an ExB separator (2016-05-31),
3. 8957394 - Compact high-voltage electron gun (2015-02-17),
4. 8642981 - Electron microscope assembly for viewing the wafer plane image of an electron beam lithography tool (2014-02-04),
5. 8373144 - Quasi-annular reflective electron patterning device (2013-02-12),
6. 8253119 - Well-based dynamic pattern generator (2012-08-28),
7. 7714287 - Apparatus and method for obtaining topographical dark-field images in a scanning electron microscope (2010-05-11),
8. 6828571 - Apparatus and methods of controlling surface charge and focus (2004-12-07),
9. 6262425 - Curvilinear axis set-up for charged particle lithography (2001-07-17),
10. 6069684 - Electron beam projection lithography system (EBPS) (2000-05-30),
11. 5793048 - Curvilinear variable axis lens correction with shifted dipoles (1998-08-11),
12. 5747814 - Method for centering a lens in a charged-particle system (1998-05-05),
13. 5650628 - Simultaneous deflections in charged-particle beams (1997-07-22),
14. 5635719 - Variable curvilinear axis deflection means for particle optical lenses (1997-06-03),
15. 5585629 - Electron beam nano-metrology system (1996-12-17),

Title: Inventor Spotlight: Paul F. Petric

Introduction:

Paul F. Petric, a prolific inventor based in Brewster, NY, has made significant contributions to the field of electron beam lithography. With an impressive portfolio of 20 patents to his name, Petric's innovative spirit and dedication to pushing the boundaries of technology are truly commendable.

Latest Patents:

Among his latest patents is the "Apparatus and methods for electron beam lithography using array cathode." This patent showcases an apparatus that employs an array of cold cathode electron sources to generate a patterned array of electron beams for lithography purposes. Additionally, Petric's patent on "Reflection electron beam projection lithography using an ExB separator" introduces an apparatus that facilitates reflection electron beam lithography with enhanced efficiency and precision.

Career Highlights:

Throughout his career, Paul F. Petric has established himself as a trailblazer in the technology sector. He has notably worked at renowned companies such as IBM and KLA-Tencor Corporation, where he honed his skills and expertise in the field of electron beam lithography. Petric's innovative approach and relentless pursuit of excellence have led to the development of groundbreaking technologies that have the potential to revolutionize the industry.

Collaborations:

During his tenure at IBM and KLA-Tencor Corporation, Paul F. Petric had the opportunity to collaborate with esteemed professionals in the field. Notable coworkers include Mark Armstrong McCord and Guenther O. Langner, who have contributed their expertise and insights to various projects alongside Petric. These collaborations have undoubtedly played a crucial role in Petric's success and the advancement of electron beam lithography technology.

Conclusion:

In conclusion, Paul F. Petric's remarkable journey as an inventor exemplifies the power of innovation and perseverance in driving technological advancements. His patented inventions stand as a testament to his ingenuity and dedication to pushing the boundaries of what is possible in the realm of electron beam lithography. As a visionary in his field, Petric continues to inspire future generations of inventors and innovators to strive for excellence and pursue their passions in the ever-evolving world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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