The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
Aug. 19, 2008
Apparatus and method for obtaining topographical dark-field images in a scanning electron microscope
Edward M. James, San Francisco, CA (US);
YE Yang, Fremont, CA (US);
Mark Lin, San Jose, CA (US);
Alexander J. Gubbens, Redwood City, CA (US);
Paul Petric, Pleasanton, CA (US);
Edward M. James, San Francisco, CA (US);
Ye Yang, Fremont, CA (US);
Mark Lin, San Jose, CA (US);
Alexander J. Gubbens, Redwood City, CA (US);
Paul Petric, Pleasanton, CA (US);
KLA-Tencor Corporation, San Jose, CA (US);
Abstract
An electron beam apparatus is configured for dark field imaging of a substrate surface. Dark field is defined as an operational mode where the image contrast is sensitive to topographical features on the surface. A source generates a primary electron beam, and scan deflectors are configured to deflect the primary electron beam so as to scan the primary electron beam over the substrate surface whereby secondary and/or backscattered electrons are emitted from the substrate surface, said emitted electrons forming a scattered electron beam. A beam separator is configured to separate the scattered electron beam from the primary electron beam. The apparatus includes a cooperative arrangement which includes at least a ring-like element, a first grid, and a second grid. The ring-like element and the first and second grids each comprises conductive material. A segmented detector assembly is positioned to receive the scattered electron beam after the scattered electron beam passes through the cooperative arrangement. Other embodiments, aspects and features are also disclosed. The apparatus is configured to yield good topographical contrast, high signal to noise ratio, and to accommodate a variety of scattered beam properties that result from different primary beam and scan geometry settings.