Verbank, NY, United States of America

Paul F Findeis


Average Co-Inventor Count = 4.8

ph-index = 5

Forward Citations = 89(Granted Patents)


Location History:

  • Glenham, NY (US) (1999 - 2002)
  • Verbank, NY (US) (2012 - 2015)

Company Filing History:


Years Active: 1999-2015

where 'Filed Patents' based on already Granted Patents

10 patents (USPTO):

Title: The Innovative Contributions of Paul F. Findeis

Introduction

Paul F. Findeis is a notable inventor based in Verbank, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work primarily focuses on etching methods and through-silicon via structures, which are essential in modern electronics.

Latest Patents

Among his latest patents is a method for selective etching bath methods. This etching method involves processing silicon wafers with specific etchants to achieve desired results. The process includes dissolving silicon dioxide (SiO) and silicon nitride (SiN) in a first etchant, leading to the precipitation of insoluble SiO. The method also details the combination of etchants to optimize etching rates for different materials. Another significant patent is for a method of fabricating coaxial through-silicon vias (TSVs). This innovative approach allows for the creation of unique interconnects within silicon substrates, enhancing the functionality and reliability of electronic devices.

Career Highlights

Throughout his career, Paul F. Findeis has worked with prominent companies such as IBM and General Wire & Stamping Company. His experience in these organizations has contributed to his expertise in semiconductor manufacturing and innovation.

Collaborations

Paul has collaborated with notable professionals in the field, including William Harrington Brearley and Laertis Economikos. These partnerships have fostered advancements in technology and have led to the development of groundbreaking inventions.

Conclusion

Paul F. Findeis is a distinguished inventor whose work has significantly impacted the semiconductor industry. His innovative patents and collaborations highlight his commitment to advancing technology. His contributions continue to influence the field and inspire future innovations.

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