Palo Alto, CA, United States of America

Patrick John Tae

This inventor holds 20 USPTO granted patents and 5 published patent applications, primarily in Plasma Sensing Technology. Top assignees: Applied Materials, Inc., Intel Corporation. Active years: 2022-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Patrick John Tae. Retrieved from https://idiyas.com/inventor/patrick-john-tae

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 20 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Location History:

  • Palo Alto, CA (US) (2022 - 2023)
  • Sunnyvale, CA (US) (2023 - 2024)

Company Filing History:


Years Active: 2022-2026

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Areas of Expertise:
Capacitive Sensing
Plasma Chamber
Condition Monitoring
Optical Reflectometry
In-Situ Measurement
Film Thickness
Dielectric Constant
Smart Camera
Process Characterization
Sensor Integration
Transmission Correction
Edge Ring Erosion
20 patents (USPTO):Explore Patents

Title: The Innovative Journey of Patrick John Tae

Introduction: Patrick John Tae, a visionary inventor based in Palo Alto, CA, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Patrick John Tae holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing his diverse range of expertise.

Career Highlights: With a background in engineering and a passion for problem-solving, Patrick John Tae has led successful projects that have revolutionized industries and improved the lives of many.

Collaborations: Throughout his career, Patrick John Tae has collaborated with leading research institutions, top companies, and brilliant minds in the field, fostering a culture of innovation and excellence.

Conclusion: Patrick John Tae's relentless pursuit of innovation and his commitment to pushing the boundaries of what is possible make him a true pioneer in the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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