Patrick John Tae

This inventor holds 20 USPTO granted patents and 5 published patent applications. Top assignees: Applied Materials, Inc., Intel Corporation. Active years: 2022-2026.

USPTO Granted Patents = 20 (Patent Applications = 5)

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)

Location History:

Palo Alto, CA (US) (2022 - 2023)
Sunnyvale, CA (US) (2023 - 2024)

Company Filing History:

19 out of 14,391

Applied Materials, Inc.

Years Active: 2022-2026

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20 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12537179 - Capacitive sensing data integration for plasma chamber condition monitoring (2026-01-27),

2. 12469686 - Process characterization and correction using optical wall process sensor (OWPS) (2025-11-11),

3. 12442765 - Transmission corrected plasma emission using in-situ optical reflectometry (2025-10-14),

4. 12437979 - Capacitive sensors and capacitive sensing locations for plasma chamber condition monitoring (2025-10-07),

5. 12432461 - Smart camera substrate (2025-09-30),

6. 12163911 - Capacitive sensor housing for chamber condition monitoring (2024-12-10),

7. 12123090 - Differential capacitive sensor for in-situ film thickness and dielectric constant measurement (2024-10-22),

8. 12114083 - Smart camera substrate (2024-10-08),

9. 12031910 - Transmission corrected plasma emission using in-situ optical reflectometry (2024-07-09),

10. 12009236 - Sensors and system for in-situ edge ring erosion monitor (2024-06-11),

11. 12009191 - Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wall (2024-06-11),

12. 12000041 - Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner (2024-06-04),

13. 11781214 - Differential capacitive sensors for in-situ film thickness and dielectric constant measurement (2023-10-10),

14. 11736818 - Smart camera substrate (2023-08-22),

15. 11708635 - Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner (2023-07-25),

Title: The Innovative Journey of Patrick John Tae

Introduction: Patrick John Tae, a visionary inventor based in Palo Alto, CA, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Patrick John Tae holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing his diverse range of expertise.

Career Highlights: With a background in engineering and a passion for problem-solving, Patrick John Tae has led successful projects that have revolutionized industries and improved the lives of many.

Collaborations: Throughout his career, Patrick John Tae has collaborated with leading research institutions, top companies, and brilliant minds in the field, fostering a culture of innovation and excellence.

Conclusion: Patrick John Tae's relentless pursuit of innovation and his commitment to pushing the boundaries of what is possible make him a true pioneer in the world of technology.