Holliston, MA, United States of America

Patrick Doering

USPTO Granted Patents = 25 

 

Average Co-Inventor Count = 2.5

ph-index = 6

Forward Citations = 206(Granted Patents)


Company Filing History:


Years Active: 2003-2019

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25 patents (USPTO):Explore Patents

Title: Innovations by Patrick Doering in Chemical Mechanical Planarization

Introduction

Patrick Doering, based in Holliston, MA, is a prolific inventor with a remarkable portfolio of 25 patents. His contributions primarily focus on innovations related to chemical mechanical planarization (CMP) technologies, which are essential in the semiconductor manufacturing process.

Latest Patents

Among his latest inventions, two notable patents stand out. The first is a CMP pad conditioning assembly that features support structures positioned between abrasive regions of the pad conditioning assembly. This innovative design allows for channels to be created between the support structures and abrasive regions, enhancing the performance of the CMP process. The top surfaces of these support structures are intentionally designed to be lower in height compared to the abrasive regions, fostering improved efficiency in planarization.

The second patent pertains to a method of packaging a CMP brush. This method includes saturating the brush with a liquid and encasing the cylindrical portion in a flexible sheet. It is designed to ensure safe transport and storage of the CMP brush by supporting the end connections within a rigid polymer tubular container, complemented by an additional exterior packaging layer for added protection.

Career Highlights

Throughout his career, Patrick Doering has worked with leading companies in the diamond technology sector. Notable organizations include Apollo Diamond, Inc and Scio Diamond Technology Corporation, where his inventive spirit has significantly contributed to advancing CMP technologies.

Collaborations

Patrick has collaborated with esteemed colleagues such as Robert C. Linares and Alfred Genis. These partnerships have fostered an environment of innovation, pushing the boundaries of what is possible in the field of semiconductor manufacturing and diamond technology.

Conclusion

Patrick Doering's contributions to the field of chemical mechanical planarization through his extensive patent portfolio highlight his role as a leading innovator. His work not only enhances manufacturing processes but also positions him as an influential figure within the technology sector, paving the way for future advancements in semiconductor technology.

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