The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2014
Filed:
Jul. 11, 2005
Patrick J. Doering, Holliston, MA (US);
Alfred Genis, East Douglas, MA (US);
Robert C. Linares, Sherborn, MA (US);
John J. Calabria, Maynard, MA (US);
Patrick J. Doering, Holliston, MA (US);
Alfred Genis, East Douglas, MA (US);
Robert C. Linares, Sherborn, MA (US);
John J. Calabria, Maynard, MA (US);
SCIO Diamond Technology Corporation, Greer, SC (US);
Abstract
Plasma assisted chemical vapor deposition is used to form single crystal diamond from a seed and methane. A susceptor is used to support the seed. Under certain conditions, crystalline grit is formed in addition to the diamond. The crystalline grit in one embodiment comprises mono crystals or twin crystals of carbon, each having its own nucleus. The crystals form in columns or tendrils to the side of the monocrystalline diamond or off a side of the susceptor. The crystals may have bonding imperfections which simulate doping, providing conductivity. They may also be directly doped. Many tools may be coated with the grit.