Newburgh, NY, United States of America

Patricia A O'Neil


Average Co-Inventor Count = 3.8

ph-index = 3

Forward Citations = 129(Granted Patents)


Location History:

  • Wappingers Falls, NY (US) (2001 - 2002)
  • Fishkill, NY (US) (2004)
  • Newburgh, NY (US) (2004 - 2012)

Company Filing History:


Years Active: 2001-2012

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7 patents (USPTO):

Title: Patricia A O'Neil: Innovator in Integrated Circuit Design

Introduction

Patricia A O'Neil is a prominent inventor based in Newburgh, NY (US), known for her significant contributions to the field of integrated circuit design. With a total of 7 patents to her name, she has developed innovative methods and apparatuses that enhance the efficiency and accuracy of manufacturing processes in the semiconductor industry.

Latest Patents

Among her latest patents is an invention titled "Apparatus, method and computer program product for fast simulation of manufacturing effects during integrated circuit design." This patent outlines methods, apparatus, and computer program products that provide a fast and accurate model for simulating the effects of chemical mechanical polishing (CMP) steps during the fabrication of integrated circuits. The invention involves generating a design of an integrated circuit while using a simplified model to predict physical characteristics resulting from CMP processing steps. This predictive capability allows for performance adjustments based on the anticipated outcomes.

Another notable patent is "Implementing integrated circuit yield estimation using Voronoi diagrams." This method computes Voronoi regions for original integrated circuit layouts and assesses failure probabilities based on geometric parameters. By encoding these probabilities for visual differentiation, the invention aids in optimizing design edges to reduce failure rates.

Career Highlights

Patricia A O'Neil is currently employed at International Business Machines Corporation (IBM), where she continues to push the boundaries of innovation in integrated circuit technology. Her work has been instrumental in advancing the methodologies used in semiconductor manufacturing, making her a key figure in the industry.

Collaborations

Throughout her career, Patricia has collaborated with notable colleagues, including Cyril Cabral, Jr. and Christian Lavoie. These partnerships have fostered a collaborative environment that enhances the development of cutting-edge technologies.

Conclusion

Patricia A O'Neil's contributions to integrated circuit design exemplify the impact of innovative thinking in technology. Her patents not only reflect her expertise but also pave the way for advancements in semiconductor manufacturing processes.

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