This inventor holds 4 USPTO granted patents, plus 2 CIPO patents and 4 EPO patents. Top assignees: Centre National De La Recherche Scientifique, Sorbonne Université, Université De Paris. Active years: 2015-2021.
Company Filing History:
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Years Active: 2015-2021
Title: Pascale Senellart: Innovator in Lithography Processes
Introduction
Pascale Senellart is a prominent inventor based in Orsay, France. He has made significant contributions to the field of lithography, particularly in processes that involve fragile nanostructures and light emitters. With a total of 4 patents, his work has advanced the capabilities of lithographic techniques.
Latest Patents
Senellart's latest patents include innovative processes that enhance lithography applications. One notable patent is the "Electron-beam lithography process adapted for a sample comprising at least one fragile nanostructure." This process involves using an optical device to determine the position of selected structures and markers on a sample. It utilizes an electron-beam device to accurately expose the upper layer of resist while preserving the lower layer above the selected structure. Another significant patent is the "Optical lithography process adapted for a sample comprising at least one fragile light emitter." This process includes exciting a selected emitter with light and detecting the emitted light to determine the emitter's position, followed by curing a part of the resist layer above it.
Career Highlights
Throughout his career, Pascale Senellart has worked with esteemed institutions such as the Centre National de la Recherche Scientifique and Sorbonne Université. His research has focused on developing advanced lithographic techniques that push the boundaries of current technology.
Collaborations
Senellart has collaborated with notable colleagues, including Agnès Maitre and Amit Raj Dhawan. These partnerships have contributed to the innovative nature of his work and the successful development of his patents.
Conclusion
Pascale Senellart's contributions to lithography processes demonstrate his expertise and commitment to innovation in the field. His patents reflect a deep understanding of the complexities involved in working with fragile structures and light emitters.