The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2020
Filed:
Feb. 12, 2018
Centre National DE LA Recherche Scientifique, Paris, FR;
Sorbonne Universite, Paris, FR;
Universite Paris Diderot—paris 7, Paris, FR;
Agnès Maitre, Paris, FR;
Amit Raj Dhawan, Paris, FR;
Pascale Senellart, Orsay, FR;
Cherif Belacel, Paris, FR;
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, Paris, FR;
SORBONNE UNIVERSITE, Paris, FR;
UNIVERSITE DE PARIS, Paris, FR;
Abstract
Disclosed is a lithography process on a sample with at least one emitter, the process including: putting at least one layer of resist above the sample; exciting one selected emitter with light through the at least one layer of resist; detecting light emitted by the excited selected emitter and determining a position of the selected emitter; and curing with a light beam a part of the at least one layer of resist above the position of the selected emitter, the light beam being a shaped light beam having a cross-section, this cross-section having a central part, an intermediate part surrounding the central part and a border part surrounding the intermediate part, the intensity of the shaped light beam on the at least one layer of resist reaching a maximum at the intermediate part.