This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignees: Centre National De La Recherche Scientifique, Sorbonne Université, Université De Paris. Active years: 2020-2021.
Company Filing History:
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Years Active: 2020-2021
Title: Agnès Maitre: Innovator in Lithography Processes
Introduction
Agnès Maitre is a prominent inventor based in Paris, France. He has made significant contributions to the field of lithography, particularly in processes that involve fragile nanostructures and light emitters. With a total of 2 patents, Maitre's work showcases his innovative approach to complex technological challenges.
Latest Patents
Maitre's latest patents include an "Electron-beam lithography process adapted for a sample comprising at least one fragile nanostructure." This patent discloses a lithography process that utilizes an optical device to determine the position of selected structures and markers on a sample. The process involves exposing an upper layer of resist to an electron beam while preserving the lower layer, ensuring the integrity of fragile nanostructures.
Another notable patent is the "Optical lithography process adapted for a sample comprising at least one fragile light emitter." This process involves exciting a selected emitter with light through a layer of resist and detecting the emitted light to determine the emitter's position. The curing of the resist layer is achieved using a shaped light beam, which optimizes the exposure for precise lithography.
Career Highlights
Agnès Maitre has worked with esteemed institutions such as the Centre National de la Recherche Scientifique and Sorbonne Université. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking research in lithography.
Collaborations
Maitre has collaborated with notable colleagues, including Amit Raj Dhawan and Pascale Senellart. These partnerships have further enriched his research and development efforts in the field of lithography.
Conclusion
Agnès Maitre's innovative work in lithography processes highlights his expertise and dedication to advancing technology. His contributions are significant in the realm of fragile nanostructures and light emitters, marking him as a key figure in the field.