Company Filing History:
2 out of 5,101 
2 out of 241 
1 out of 109 
Years Active: 2020-2021
Title: Cherif Belacel: Innovator in Lithography Processes
Introduction
Cherif Belacel is a notable inventor based in Paris, France. He has made significant contributions to the field of lithography, particularly in processes that involve fragile nanostructures and light emitters. With a total of 2 patents, his work showcases innovative techniques that enhance the precision and effectiveness of lithographic applications.
Latest Patents
Cherif Belacel's latest patents include an "Electron-beam lithography process adapted for a sample comprising at least one fragile nanostructure." This patent discloses a lithography process that involves using an optical device to determine the position of selected structures and markers on a sample. The process utilizes an electron-beam device to accurately expose the upper layer of resist above the selected structure while preserving the lower layer.
Another significant patent is the "Optical lithography process adapted for a sample comprising at least one fragile light emitter." This process involves exciting a selected emitter with light through a layer of resist, detecting the emitted light, and curing a part of the resist above the emitter's position. The light beam used in this process is shaped to maximize intensity at the emitter's location, ensuring precise lithographic results.
Career Highlights
Cherif Belacel has worked with prestigious institutions such as the Centre National de la Recherche Scientifique and Sorbonne Université. His experience in these organizations has allowed him to develop and refine his innovative lithography techniques, contributing to advancements in the field.
Collaborations
Throughout his career, Cherif has collaborated with notable colleagues, including Agnès Maitre and Amit Raj Dhawan. These collaborations have further enriched his research and development efforts in lithography.
Conclusion
Cherif Belacel stands out as an influential inventor in the realm of lithography, with his innovative processes paving the way for advancements in the field. His contributions are significant, and his patents reflect a deep understanding of the complexities involved in working with fragile structures.