Pang-Shiuan Liu

Title: The Innovations of Pang-Shiuan Liu

Introduction

Pang-Shiuan Liu is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on advancing semiconductor devices, particularly through innovative manufacturing methods.

Latest Patents

One of his latest patents is titled "Impact ionization semiconductor device and manufacturing method thereof." This patent describes a semiconductor device that includes a field effect transistor (FET) device. The device features a substrate and a channel structure formed of a two-dimensional (2D) material over the substrate. Source and drain contacts are formed partially over the 2D material. A first dielectric layer is formed at least partially over the channel structure and at least partially over the source and drain contacts. This first dielectric layer is configured to trap charge carriers. Additionally, a second dielectric layer is formed over the first dielectric layer, and a gate electrode is formed over the second dielectric layer.

Career Highlights

Pang-Shiuan Liu has worked with prominent organizations in the semiconductor industry. He has been associated with Taiwan Semiconductor Manufacturing Company Ltd. and National Yang Ming Chiao Tung University. His experience in these institutions has allowed him to collaborate with leading experts in the field.

Collaborations

Some of his notable coworkers include Tuo-Hung Hou and Samuel C Pan. Their collaborative efforts have contributed to advancements in semiconductor technology.

Conclusion

Pang-Shiuan Liu's innovative work in semiconductor devices and his collaborations with esteemed colleagues highlight his significant impact on the field. His contributions continue to shape the future of semiconductor technology.