Pan Yuan

Title: Pan Yuan: Innovator in Semiconductor Technology

Introduction

Pan Yuan is a prominent inventor based in Hefei, China, known for his contributions to the field of semiconductor technology. With a total of 3 patents to his name, he has made significant strides in developing advanced semiconductor structures and manufacturing methods.

Latest Patents

One of Pan Yuan's latest patents is titled "Semiconductor structure with silicon-germanium compound and manufacturing method thereof." This invention provides a semiconductor structure and a manufacturing method that relates to the technical field of semiconductors. The method includes providing a substrate that consists of a first semiconductor material layer, a silicon-germanium compound layer, and a second semiconductor material layer stacked sequentially. It involves forming first trenches extending along a first direction and second trenches extending along a second direction within the substrate, which separates it into multiple spaced pillar structures. The pillar structures are then doped to form a channel region in the silicon-germanium compound layer. Finally, a dielectric layer is formed on the outer peripheral surface of each pillar structure, along with a gate positioned opposite at least part of the channel region.

Another notable patent is also titled "Semiconductor structure and manufacturing method thereof." This patent outlines a manufacturing method that begins with providing a base and forming a bottom electrode layer on it. The crystal structure of the bottom electrode layer includes a tetragonal crystal system. A first dielectric layer is then formed on the surface of the bottom electrode layer using it as a seed layer, which also has a tetragonal crystal structure. The process concludes with the formation of a first current blocking layer on the surface of the first dielectric layer.

Career Highlights

Pan Yuan has worked with notable companies such as Changxin Memory Technologies and Beijing Superstring Academy of Memory Technology. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Throughout his career, Pan Yuan has collaborated with talented individuals, including Xiaojie Li and Xingsong Su. These collaborations have likely enriched his work and led to further advancements in his field.

Conclusion

Pan Yuan is a distinguished inventor whose work in semiconductor technology has led to several innovative patents. His contributions continue to influence the industry and pave the way for future advancements in semiconductor manufacturing.