Palanivel Balasubramaniam

Title: Palanivel Balasubramaniam: Innovator in Semiconductor Technology

Introduction

Palanivel Balasubramaniam is a notable inventor based in Singapore, recognized for his contributions to semiconductor technology. He holds a total of 3 patents that reflect his innovative approach to device fabrication and enhancement.

Latest Patents

One of his latest patents is titled "Modifying growth rate of a device layer." This invention involves a device that includes a substrate with a device region where a transistor is formed. The device region consists of active edge regions and an active center region that exhibit different oxidation growth rates. A growth rate modifier (GRM) comprising dopants is utilized to produce a gate oxide layer with uniform thickness. Depending on the type of dopants used, the GRM can either enhance or retard the oxidation growth rate. For instance, fluorine dopants enhance the oxidation growth rate, while nitrogen dopants retard it.

Another significant patent is the "Method for forming PLDD structure with minimized lateral dopant diffusion." This method describes the formation of a MOSFET with an LDD structure that minimizes lateral dopant diffusion. The process begins with a gate electrode overlying a gate dielectric layer on a semiconductor substrate. Dielectric spacers are formed on the sidewalls of the gate electrode, followed by the formation of source and drain regions associated with the gate electrode. The gate electrode and source and drain regions are then silicided. Afterward, the spacers are removed to expose the semiconductor substrate, allowing for the formation of LDD regions using plasma doping to complete the LDD structure in the integrated circuit device fabrication.

Career Highlights

Palanivel has worked with prominent companies in the semiconductor industry, including Chartered Semiconductor Manufacturing Ltd and Globalfoundries Singapore Pte. Ltd. His experience in these organizations has significantly contributed to his expertise in semiconductor device fabrication.

Collaborations

Some of his notable coworkers include Yelehanka Ramachandramurthy Pradeep and Subrahamanyam Chivukula, who have collaborated with him on various projects in the field of semiconductor technology.

Conclusion

Palanivel Balasubramaniam's innovative patents and extensive experience in the semiconductor industry highlight his significant contributions to technology. His work continues to influence advancements in device fabrication and semiconductor technology.