Pai Hung Pan

Title: Innovations and Contributions of Pai Hung Pan in Semiconductor Technology

Introduction

Pai Hung Pan, based in Boise, ID, is an accomplished inventor with a remarkable track record of 20 patents. His innovative work primarily focuses on semiconductor technology, particularly in the area of trench isolation structures. This article explores his latest patents, career highlights, and notable collaborations.

Latest Patents

One of Pai Hung Pan's latest patents is titled "Technique for Forming Shallow Trench Isolation Structure Without Corner Exposure." This invention outlines a method for creating a shallow isolation trench structure that incorporates a layered formation. The method includes using a buffer film layer made of oxidation-resistant material over a dielectric layer, all resting on a semiconductor substrate. The process involves patterning the layered structure with a resist material and etching to establish a shallow trench, followed by the formation of an oxide layer and selective etching to recede the buffer film layer from the trench corners. The resulting structure serves to effectively isolate different components on the semiconductor substrate.

Another significant patent is the "Method for Trench Isolation by Selective Deposition of Low Temperature Oxide Films." This patent describes a detailed method for creating isolation regions in a silicon substrate. It encompasses steps such as forming a trench, filling it with silanol polymer material, and subsequently heating the polymer to convert it into silicon dioxide, forming the isolation region. This method avoids common defects and ensures a smoother fabrication process.

Career Highlights

Throughout his career, Pai Hung Pan has made substantial contributions to the field of semiconductor technology. He has worked with reputable companies, including Micron Technology Incorporated and Micron Technology, Inc., where he applied his expertise in developing innovative isolation techniques that enhance semiconductor performance. His patents contribute significantly to advancements in the industry, showcasing his commitment to improving manufacturing processes.

Collaborations

Pan's collaborative efforts with fellow inventors such as Whonchee Lee and Karl M Robinson have played an essential role in his innovative journey. Working alongside these talented individuals has allowed for the exchange of ideas and has fostered an environment of creativity, leading to groundbreaking inventions in semiconductor technology.

Conclusion

In conclusion, Pai Hung Pan stands out as a notable inventor in the semiconductor industry, with a robust portfolio of patents that reflect his innovative spirit. His methods for trench isolation serve as significant advancements in semiconductor fabrication, ensuring efficient processes and enhanced technological performance. Through his work with various companies and collaborations with fellow inventors, Pan continues to contribute to the ever-evolving landscape of technology.