Orin W Holland

Title: Orin W Holland: Innovator in Silicon Technology

Introduction

Orin W Holland is a notable inventor based in Oak Ridge, TN (US), recognized for his contributions to silicon technology. He holds a total of 12 patents, showcasing his innovative spirit and technical expertise in the field.

Latest Patents

Holland's latest patents include a method for the transfer of thin-film silicon carbide via implantation and wafer bonding. This method involves implanting a source crystal with ions along a crystallographic channel at a temperature of at least approximately 200°C. The process aims to form a strained region and define the thin-film, followed by bonding the thin-film to a target wafer and separating them from the source crystal. This innovation enhances the quality of the transferred thin-film by ensuring that the electrical carriers in the crystal remain active.

Another significant patent is related to the formation of a buried oxide layer in silicon. This process incorporates ion implantation of oxygen into a silicon substrate at elevated temperatures, followed by additional steps to create a continuous silicon oxide layer beneath the surface. This invention addresses the challenge of discontinuous buried oxide layers, providing a more reliable structure for silicon-on-insulator applications.

Career Highlights

Throughout his career, Orin W Holland has worked with prominent organizations, including Motorola Corporation and the United States of America as represented by the United States. His work has significantly impacted the field of semiconductor technology, particularly in the development of advanced silicon materials.

Collaborations

Holland has collaborated with notable colleagues such as John R Alvis and James R Pfiester. These partnerships have contributed to the advancement of his research and innovations in silicon technology.

Conclusion

Orin W Holland's contributions to the field of silicon technology through his patents and collaborations highlight his role as a leading inventor. His innovative methods continue to influence advancements in semiconductor applications.