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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 4908334 B1

PDFFull Text
Date of Patent:
Mar. 13, 1990

Filed:

Jan. 24, 1989

Method for forming metallic silicide films on silicon substrates by ion

Applicant:
Inventors:

Raymond A Zuhr, Oak Ridge, TN (US);

Orin W Holland, Oak Ridge, TN (US);

Assignee:

The United States of America as represented by the United States, , US;

Attorneys:

Hamel; Stephen D.

Larcher; Earl L.

Moser; William R.

Primary Examiner:

Aaron Weisstuch

Int. Cl.
CPC ...
H01L / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
437200 ; 437196 ; 2504922 ;
Abstract

Metallic silicide films are formed on silicon substrates by contacting the substrates with a low-energy ion beam of metal ions while moderately heating the substrate. The heating of the substrate provides for the diffusion of silicon atoms through the film as it is being formed to the surface of the film for interaction with the metal ions as they contact the diffused silicon. The metallic silicide films provided by the present invention are contaminant free, of uniform stoichiometry, large grain size, and exhibit low resistivity values which are of particular usefulness for integrated circuit production.

Find Patent Forward Citations

Zuhr, Raymond. (1990). Method for forming metallic silicide films on silicon substrates by ion (U.S. Patent No. 4908334). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4908334

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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