Juechen, Germany

Oliver Rosier

This inventor holds 3 USPTO granted patents and 3 EPO patents. Top assignees: Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v., Koninklijke Philips Corporation N.v., Philips Corporate Intellectual Property Gmbh. Active years: 2004-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Oliver Rosier. Retrieved from https://idiyas.com/inventor/oliver-rosier-a8ou8jvu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Juchen, DE (2004)
  • Jüchen, DE (2005 - 2010)

Company Filing History:


Years Active: 2004-2010

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3 patents (USPTO):Explore Patents

Title: The Innovative Mind of Oliver Rosier

Introduction

Oliver Rosier is a prominent inventor based in Jüchen, Germany, whose work has significantly contributed to the fields of extreme ultraviolet (EUV) radiation and soft X-ray radiation. With a total of three patents to his name, Rosier has demonstrated his inventive prowess through innovative methods and devices aimed at advancing lithography technologies.

Latest Patents

One of Rosier's most notable patents is titled "Method and device for generating EUV radiation and/or soft X-ray radiation." This invention describes a process for producing EUV and soft X-ray radiation through plasma formation in a discharge space. The system includes an electrode setup consisting of an anode and a cathode, which transmits electrical energy to the plasma using charge carriers introduced into the discharge space. To ensure reliable plasma ignition at high repetition frequencies, the invention incorporates a radiation source to provide discharge carriers.

Another important patent from Rosier is "Method and device for the generation of far ultraviolet or soft X-ray radiation." This patent outlines a method for generating extreme ultraviolet or soft X-ray radiation via gas discharge, specifically for EUV lithography applications. The method employs a discharge vessel equipped with two high-voltage electrodes and a carefully maintained gas fill within designated pressure parameters. The generated plasma emits the necessary radiation, which can be influenced by changes in the gas fill pressure.

Career Highlights

Oliver Rosier has made significant strides in his career by collaborating with leading organizations such as Koninklijke Philips Corporation N.V. and Fraunhofer Gesellschaft zur Förderung der Angewandten Forschung e.V. His work has been instrumental in the advancement of photonic technologies, establishing him as a key figure in his field.

Collaborations

Throughout his career, Rosier has had the opportunity to work alongside esteemed colleagues like Willi Neff and Klaus Bergmann. These collaborations have allowed him to enhance his research and contribute to innovative solutions in the generation of radiation technologies.

Conclusion

Oliver Rosier's contributions to the development of methods for generating EUV and soft X-ray radiation have positioned him as a notable inventor in the field of lithography. With his continued dedication to innovation and collaboration with leading organizations, Rosier's work is expected to have a lasting impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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