The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2005
Filed:
Mar. 21, 2002
Willi Neff, Kelmis, BE;
Klaus Bergmann, Herzogenrath, DE;
Oliver Rosier, Jüchen, DE;
Joseph Pankert, Aachen, DE;
Willi Neff, Kelmis, BE;
Klaus Bergmann, Herzogenrath, DE;
Oliver Rosier, Jüchen, DE;
Joseph Pankert, Aachen, DE;
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., München, DE;
Philips Corporate Intellectual Property GmbH, Hamburg, DE;
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Abstract
In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.