The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
Dec. 13, 2004
Günther Hans Derra, Aachen, DE;
Rolf Theo Anton Apetz, Aachen, DE;
Willi Neff, Kelmis, BE;
Oliver Rosier, Jüchen, DE;
Peter Zink, Aachen, DE;
Günther Hans Derra, Aachen, DE;
Rolf Theo Anton Apetz, Aachen, DE;
Willi Neff, Kelmis, BE;
Oliver Rosier, Jüchen, DE;
Peter Zink, Aachen, DE;
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Abstract
A method of generating in particular EUV radiation () and/or soft X-ray radiation () emitted by a plasma () is described. The plasma () is formed by an operating gas () in a discharge space () which comprises at least one radiation emission window () and an electrode system with at least one anode () and at least one cathode (). This electrode system transmits electrical energy to the plasma () by means of charge carriers () introduced into the discharge space (). It is suggested for obtaining a reliable ignition of the plasma () at high repetition frequencies that a radiation () generated by at least one radiation source () is introduced into the discharge space () for making available the discharge carriers ().