Koninklijke Philips Corporation N.v.

Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Philips Corporate Intellectual Property Gmbh

Koninklijke Philips Electronics N.v.

Philips Intellectual Property & Standards Gmbh

Oliver Rosier

Willi Neff

Klaus Bergmann

Peter Zink

Rolf Theo Anton Apetz

Joseph Rr Pankert

Rainer Lebert

Günther Hans Derra

A method of generating in particular EUV radiation () and/or soft X-ray radiation () emitted by a plasma () is described. The plasma () is formed by an operating gas () in a discharge space () which comprises at least one radiation emission window () and an electrode system with at least one anode () and at least one cathode (). This electrode system transmits electrical energy to the plasma () by means of charge carriers () introduced into the discharge space (). It is suggested for obtaining a reliable ignition of the plasma () at high repetition frequencies that a radiation () generated by at least one radiation source () is introduced into the discharge space () for making available the discharge carriers ().

Method and device for generating EUV radiation and/or soft X-ray radiation

In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.

Method and device for the generation of far ultraviolet or soft x-ray radiation

The invention relates to a device for generating extreme ultraviolet and soft x-rays from a gas discharge, operated on the left-hand branch of the Paschen curve. There are two main electrodes, between which there is a gas-filled space, and each main electrode exhibits an opening, by means of which an axis of symmetry &lsqb;( )&rsqb; is defined; and there are means to increase the conversion efficiency. Preferred fields of application are those requiring extreme ultraviolet (EUV) radiation or soft x-rays at a wavelength ranging from approximately 1 to 20 nm, and in particular around 13 nm, such as in EUV lithography.

Device for producing an extreme ultraviolet and soft x radiation from a gaseous discharge

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Jüchen, Germany

Oliver Rosier