Dresden, Germany

Olaf Zywitzki


 

Average Co-Inventor Count = 7.1

ph-index = 4

Forward Citations = 39(Granted Patents)


Location History:

  • Freiberg, DE (1997 - 2004)
  • Dresden, DE (2002 - 2022)
  • Munich, DE (2022)

Company Filing History:


Years Active: 1997-2022

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10 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Olaf Zywitzki

Introduction

Olaf Zywitzki is a prominent inventor based in Dresden, Germany. He has made significant contributions to the field of materials science, particularly in the development of multi-layer functional films and advanced deposition methods. With a total of 10 patents to his name, Zywitzki's work has garnered attention for its innovative approaches and practical applications.

Latest Patents

One of Zywitzki's latest patents is a method for preparing a multi-layer assembly that protects surfaces from damage and contamination. This method involves providing a composite film with a polymeric base layer and a protective layer, followed by the application of functional layers that include zinc and/or tin. Another notable patent focuses on a method for depositing a CdTe layer on a substrate using physical gas phase deposition in a vacuum chamber. This technique enhances the efficiency of the coating process by ensuring optimal conditions for the substrate.

Career Highlights

Throughout his career, Zywitzki has worked with esteemed organizations such as the Fraunhofer Society for the Advancement of Applied Research and Sandvik AB. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking research in his field.

Collaborations

Zywitzki has collaborated with notable colleagues, including Klaus Goedicke and Fred Fietzke. These partnerships have facilitated the exchange of ideas and fostered innovation in their respective projects.

Conclusion

Olaf Zywitzki's contributions to the field of materials science through his patents and collaborations highlight his role as a leading inventor. His innovative methods and dedication to research continue to influence advancements in technology and materials.

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