Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Sandvik Ab

Other

Dupont Teijin Films U.S. Limited Partnership

Ctf Solar Gmbh

Olaf Zywitzki

Klaus Goedicke

Siegfried Schiller

Fred Fietzke

Bj&ouml;rn Ljungberg

Mats Sj&ouml;strand

Viveka Alfredsson

Tomas Hilding

Christoph Metzner

Jonathan Reschke

Torsten Werner

Wolfgang Hempel

Daniel Hirsch

Gunter Hotzsch

Robert William Eveson

Matthias Fahland

Mats Ahlgren

Bastian Siepchen

Henry Morgner

Krishnakumar Velappan

Torbj&ouml;rn Selinder

Christian Drost

John Fahlteich

Nicole Prager

Bettina Späth

Christian Kraft

Torsten Kopte

Ludwig Decker

Valentijn Von Morgen

Thomas Modes

Robert Eveson

A method of preparing a multi-layer assembly, or of protecting a surface of a multi-layer substrate from damage and/or contamination and/or debris, said method comprising the steps of: (i) providing a composite film comprising a polymeric base layer having a first and second surface and disposed on the first surface thereof a polymeric protective layer having a first surface and a second surface such that the first surface of the said base layer is in contact with the first surface of the polymeric protective layer, wherein said polymeric protective layer comprises an ethylene-based copolymer, and preferably wherein the polymeric base layer comprises a polyester derived from one or more diol(s) and one or more dicarboxylic acid(s); (ii) removing said polymeric protective layer from the first surface of said base layer; (iii) disposing on the exposed first surface of said base layer one or more functional layers to provide a multi-layer substrate, wherein the, or at least the uppermost, functional layer comprises zinc and/or tin in an amount of from about 5 to about 80 wt % of said functional layer; and (iv) disposing a polymeric protective layer comprising an ethylene-based copolymer onto the exposed surface of the, or at least the uppermost, functional layer comprising zinc and/or tin to provide a multi-layer assembly.

Multi-layer functional film and production method thereof

A method for depositing a CdTe layer on a substrate in a vacuum chamber by means of physical gas phase deposition is provided. The substrate is heated to a coating temperature before the deposition process and then guided past a vessel in which CdTe is converted into a vapour state, a gaseous component with an increased pressure (compared to the vacuum in the vacuum chamber) flowing through at least one inlet, against the substrate surface to be coated, such that the gaseous component is adsorbed on the substrate surface to be coated before the substrate is guided past the at least one vessel.

Method for depositing a CdTe layer on a substrate

A method for producing a CdTe solar cell is provided, wherein at least the following layers are deposited on a glass substrate within a vacuum chamber: a TCO layer acting as a frontal contact; at least one CdTe layer; a thin layer of a chlorine-containing compound, and an electrically conductive layer acting as a return contact. Here, a maximally 20 nm thick passivation layer made from CdS, in which chemically non-bound oxygen is embedded, is deposited on the TCO layer prior to deposition of at least one CdTe-layer.

Method for producing a CdTe solar cell

The present invention describes a coated cutting tool for metal machining. The coating is formed by one or more layers of refractory compounds of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al O , with a grainsize less than 0.1 &mgr;m. The Al O layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450&deg; C. to 700&deg; C. preferably 550&deg; C. to 650&deg; C., depending on the particular material of the tool body to be coated. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the (400) and (440) planes occurring at the 2&thgr;0- angles 45.8 and 66.8 degrees when using Cu radiation identify the &ggr;-phase Al O . The alumina layer is also very strongly textured in the &lsqb;440&rsqb;-direction. The Al O layer is virtually free of cracks and halogen impurities. Furthermore, the Al O layer gives the cutting edge of the tool an extremely smooth surface finish.

PVD Al2O3 coated cutting tool

The present invention describes a coating cutting tool for metal machining and a process for producing such tools. The coating is composed of one or more layers of refractory compounds of which at least one layer consists of nanocrystalline aluminum spinel of the type (Me) Al O where Me is a second metal and 0<x&lE;1, deposited by Physical Vapor Deposition.

PVD coated cutting tool and method of its production

The present invention relates to a process for producing a coated cutting tool consisting of a coating and a substrate, wherein at least one refractory layer consisting of fine-grained, crystalline &ggr;-Al O is deposited by reactive magnetron sputtering onto the moving substrate in a vacuum by pulsed magnetron sputtering in a mixture of a rare gas and a reactive gas at a pulse frequency set for 10 to 100 kHz. The deposition occurs with a rate of at least 1 nm/s with reference to a stationarily arranged substrate at a magnetron target power density in time average set for at least 10 W/cm . The substrate temperature is in the range 400 to 700&deg; C. and the flux of impinging particles onto each individual substrate is cyclically interrupted.

Method of making a PVD Al2O3 coated cutting tool

The present invention describes a coated substrate material. The coating is formed by one or more layers of refractory compounds of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al O , with a grainsize less than 0.1 &mgr;m. The Al O layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450&deg; C. to 700&deg; C., preferably 550&deg; C. to 650&deg; C., depending on the particular substrate material. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the ( ) and ( ) planes occurring at the 2&thgr;-angles 45.8 and 66.8 degrees when using Cu radiation identify the &ggr;-phase Al O . The alumina layer is also very strongly textured in the &lsqb;440&rsqb;-direction. The Al O layer is virtually free of cracks and halogen impurities. Furthermore, the Al O layer gives the cutting edge of the tool an extremely smooth surface finish.

The present invention describes a coated cutting tool for metal machining. The coating is formed by one or more layers of a refractory compound of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al,O,, with a grain size of less than 0.1 &mgr;m. The Al,O,layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450&deg; C. to 700&deg; C., preferably 550&deg; C. to 650&deg; C., depending on the particular material of the tool body to be coated. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the (,) and (,) planes occurring at the 2&thgr;-angles 45.8 and 66.8 degrees when using Cu,radiation identify the &ggr;-phase Al,O,. The alumina layer is also very strongly textured in the &lsqb;(,)&rsqb;-direction. The Al,O,layer is virtually free of cracks and halogen impurities. Furthermore, the Al,O,layer gives the cutting edge of the tool an extremely smooth surface finish.

Compound body of a vacuum coated sintered material and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of sintered material coated with a layer that is thermally, mechanically and chemically unstable, with their surface showings cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process, wherein at least one layer of a material, having an outer layer of Al.sub.2 O.sub.3, is applied to the carrier of sintered material at a maximum of 800.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub..sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 GPa and a hardness of at least 20 GPa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse driven, the pulse frequency lies between 20 and 100 Khz and the deposition rate is at least 1 nm/s, with the resulting compound bodies being utilized for cutting treatments, particularly as cemented carbide inserts.

Compound body of vacuum-coated sintered material and process for its

Vacuum coated compound body and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of a metal or of an alloy, a layer that is thermally, mechanically and chemically unstable, with their surface showing cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process wherein at least one layer of a material having an outer layer is of Al.sub.2 O.sub.3, is applied to the metal or alloy carrier at a maximum of 700.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 Gpa and a hardness of at least 20 Gpa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse powered, the pulse frequency lies between 20 and 100 Khz, and the deposition rate is at least 1 nm/s, with the compound bodies being utilized for cutting treatments, particularly as drills, milling cutters, reamers, broaches or saw blades.

Vacuum-coated compound body and process for its production

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Dresden, Germany

Olaf Zywitzki