Miyagi, Japan

Nozomu Nagashima

USPTO Granted Patents = 9 

Average Co-Inventor Count = 2.3

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2018-2025

where 'Filed Patents' based on already Granted Patents

9 patents (USPTO):

Title: The Innovative Contributions of Nozomu Nagashima

Introduction

Nozomu Nagashima is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing and plasma technology. With a total of 9 patents to his name, Nagashima continues to push the boundaries of innovation in his industry.

Latest Patents

Among his latest patents is a substrate processing apparatus and maintenance method for substrate processing apparatus. This invention features a chamber with a sidewall and an opening, a substrate support, and a support member positioned above the substrate support. It also includes an inner wall member with a ceiling portion and a contact member designed to detachably fix the inner wall member to the support member. Additionally, an actuator is incorporated to facilitate the movement of the inner wall member for maintenance purposes. Another notable patent is a filter device and plasma processing apparatus, which consists of two coil groups arranged along a central axis. The first coil group has a smaller inner diameter, while the second coil group has a larger inner diameter, with a pitch difference between their respective coils.

Career Highlights

Nozomu Nagashima is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in advancing technologies that are crucial for modern electronics.

Collaborations

Throughout his career, Nagashima has collaborated with notable colleagues, including Naohiko Okunishi and Tomoyuki Takahashi. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Nozomu Nagashima's contributions to substrate processing and plasma technology exemplify the spirit of innovation. His patents reflect a commitment to advancing technology and improving processes within the industry. As he continues to work at Tokyo Electron Limited, his impact on the field is sure to grow.

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