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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10897808 B1

PDFFull Text
Date of Patent:
Jan. 19, 2021

Filed:

Nov. 03, 2017

Filter device and plasma processing apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Nozomu Nagashima, Miyagi, JP;

Naohiko Okunishi, Miyagi, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorney:

Rothwell, Figg, Ernst & Manbeck, P.C.

Primary Examiner:

Mark H Paschall

Int. Cl.
CPC ...
B23K 10/00 (2006.01); H05H 1/46 (2006.01); H01J 37/32 (2006.01); H01L 21/3065 (2006.01); H01L 21/683 (2006.01); H03H 1/00 (2006.01); H01L 21/60 (2006.01);
U.S. Cl.
CPC ...
H05H 1/46 (2013.01); H01J 37/32174 (2013.01); H01J 37/32577 (2013.01); H01J 37/32724 (2013.01); H01J 37/32908 (2013.01); H01L 21/3065 (2013.01); H01L 21/6831 (2013.01); H03H 1/0007 (2013.01); H01L 2021/6015 (2013.01); H03H 2001/0092 (2013.01); H05H 2001/4682 (2013.01);
Abstract

A filter device includes a plurality of coils of which central axes are spaced apart from one another and in parallel to one another and a plurality of ground members spaced apart from one another and extending in parallel to the central axes of the coils outside of the coils. Each of the coils is spaced apart from another coil closest thereto by a first distance. Each of the ground members is spaced apart from a coil closest thereto by a second distance. The number of ground members spaced apart from each of the coils by the second distance is the same.

Find Patent Forward Citations

Nagashima, Nozomu. (2021). Filter device and plasma processing apparatus (U.S. Patent No. 10897808). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10897808

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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