The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2022
Filed:
Sep. 09, 2019
Tokyo Electron Limited, Tokyo, JP;
Nozomu Nagashima, Miyagi, JP;
Ryuichi Yui, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
An adjustment method for filter units in a plasma processing apparatus includes a first measurement process of measuring a frequency characteristic of a reference filter unit selected among the filter units, and an adjustment process of adjusting a frequency characteristic of each of remaining filter units selected among the filter units excluding the reference filter unit. Further, the adjustment process includes an attachment process of attaching a capacitive member for adjusting a capacitance between wirings in each of the remaining filter units, a second measurement process of measuring a frequency characteristic of each of the remaining filter units to which the capacitive member is attached, and an individual adjustment process of adjusting a capacitance of the capacitive member such that the frequency characteristic of each of the remaining filter unit to which the capacitive member is attached becomes close to the frequency characteristic of the reference filter unit.