Nagaokakyo, Japan

Noriyuki Inoue

This inventor holds 17 USPTO granted patents and 2 EPO patents, primarily in Capacitor Technology. Top assignee: Murata Manufacturing Co., Ltd.. Active years: 2008-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noriyuki Inoue. Retrieved from https://idiyas.com/inventor/noriyuki-inoue-x6rfcf4g

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 3.1

ph-index = 4

Forward Citations = 46(Granted Patents)


Location History:

  • Shiga-ken, JP (2008 - 2010)
  • Ritto, JP (2009 - 2010)
  • Yasu, JP (2013)
  • Nagaokakyo, JP (2013 - 2022)

Company Filing History:


Years Active: 2008-2022

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Areas of Expertise:
Capacitor
Multilayer Ceramic Capacitor
Dielectric Ceramic
Wafer Level Package
Manufacturing Method
Laminated Ceramic Capacitor
Electronic Component
Dielectric Composition
Monolithic Ceramic Capacitor
17 patents (USPTO):Explore Patents

Title: Noriyuki Inoue: Innovator in Capacitor Technology

Introduction

Noriyuki Inoue is a prominent inventor based in Nagaokakyo, Japan. He has made significant contributions to the field of capacitor technology, holding a total of 17 patents. His work has been instrumental in advancing the design and functionality of capacitors, which are essential components in various electronic devices.

Latest Patents

Inoue's latest patents include innovative designs for capacitors. One notable patent describes a capacitor that features an electrostatic capacitance forming portion with a first electrode, dielectric layer, and second electrode structure, along with a silicon portion. This silicon portion is strategically placed on at least part of the side of the electrostatic capacitance forming portion. Importantly, when viewed in the thickness direction, the region occupied by the silicon portion in the lower part of the electrostatic capacitance forming portion is 50% or less. Another significant patent involves a wafer level package that includes an IC chip, a rewiring layer on the IC chip, and a capacitor embedded within the rewiring layer.

Career Highlights

Noriyuki Inoue is currently associated with Murata Manufacturing Co., Ltd., a leading company in the electronics industry. His work at Murata has allowed him to focus on developing cutting-edge technologies that enhance the performance of electronic components.

Collaborations

Inoue has collaborated with notable colleagues, including Hiromasa Saeki and Takeo Arakawa. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Noriyuki Inoue's contributions to capacitor technology have made a lasting impact on the electronics industry. His innovative patents and collaborations with esteemed colleagues highlight his dedication to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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