Noriyoshi Mashimo

Title: Noriyoshi Mashimo: Innovator in Semiconductor Cleaning Technologies

Introduction

Noriyoshi Mashimo is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor cleaning technologies, holding a total of 4 patents. His innovative approaches have enhanced the efficiency and effectiveness of cleaning processes in semiconductor manufacturing.

Latest Patents

Mashimo's latest patents include an "Arrangement for cleaning semiconductor wafers using mixer" and an "Ultraviolet reactor with mixing baffle plates." The first patent describes a system for cleaning semiconductor wafers in a cleaning vessel by supplying a cleaning fluid through a supply line. A mixer is utilized to combine deionized water and cleaning gas, producing an effective cleaning fluid. After the treatment, deionized water is used to rinse the wafers. The second patent outlines an ultraviolet reactor designed for purifying liquids. This reactor features a housing that accommodates multiple ultraviolet lamps, with an inlet and outlet for liquid flow. Mixing baffle plates are strategically placed inside the housing to ensure optimal interaction between the liquid and ultraviolet light.

Career Highlights

Throughout his career, Noriyoshi Mashimo has worked with notable companies such as Kabushiki Kaisha Toshiba and Ebara Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor cleaning technologies.

Collaborations

Mashimo has collaborated with esteemed colleagues, including Katsuya Okumura and Hiroshi Nagai. Their combined expertise has contributed to advancements in the field and the successful development of new technologies.

Conclusion

Noriyoshi Mashimo's work in semiconductor cleaning technologies showcases his innovative spirit and dedication to improving manufacturing processes. His patents reflect a commitment to enhancing efficiency and effectiveness in the industry.