Kabushiki Kaisha Toshiba

Ebara Corporation

Tokyo Electron Sagami Limited

Noriyoshi Mashimo

Katsuya Okumura

Hiroshi Nagai

Yukio Ikeda

Akihito Yamamoto

Shingo Watanabe

Ken Nakajima

Masaharu Abe

Naohiko Yasuhisa

For cleaning semiconductor wafers in a cleaning vessel by supplying a cleaning fluid through a supply line thereto, a mixer is provided. Deionized water is supplied to the mixer through a deionized water supply line, and a cleaning gas is supplied thereto from a gas reservoir to produce the cleaning fluid. After treating the semiconductor wafers with the cleaning fluid, the deionized water is supplied to the cleaning vessel to rinse them.

Arrangement for cleaning semiconductor wafers using mixer

An ultraviolet reactor for purifying a liquid, comprising a housing of circular or rectangular cross-sections, a multiplicity of ultraviolet lamps accommodated in the housing, an inlet and outlet for the liquid, which are provided at both ends, respectively, of the housing, and a plurality of mixing baffle plates provided inside the housing at a proper pitch along a longitudinal axis of the housing so that the liquid flows at right angles to the ultraviolet lamps.

Ultraviolet reactor with mixing baffle plates

A heat treating apparatus comprises a reaction tube for receiving a plurality of articles to be treated and a heating unit surrounding at least part of the reaction tube. The reaction tube comprises a first structural section, at least part of which is surrounded by the heating unit and a second structural section, at least part of which extends from the heating unit. The first structural section is made of material having thermal resistivity and thermal conductivity higher than the second structural section.

Heat treating apparatus

Method of cleaning semiconductor wafers using mixer containing a bundle

Growing community of inventors

Tokyo, Japan

Noriyoshi Mashimo