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Noritaka Akita

USPTO Granted Patents = 17 (Patent Applications = 1)

Average Co-Inventor Count = 2.9

ph-index = 4

Forward Citations = 46(Granted Patents)

Location History:

Hatano, JP (1999 - 2001)
Kanagawa, JP (2000 - 2001)
Kyoto, JP (2011)
Hiratsuka, JP (2007 - 2012)
Yokohama, JP (2007 - 2012)

Company Filing History:

Advanced Lcd Technologies Development Center Co., Ltd.

patents

1 out of 3,202

Dai Nippon Printing Co., Ltd.

patents

4. 1 out of 25,560

Sharp Kabushiki Kaisha Corporation

patents

Years Active: 1999-2012

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17 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8259375 - Crystallization apparatus, crystallization method, device and phase modulation element (2012-09-04),

2. 8183122 - Semiconductor device including semiconductor thin film, which is subjected to heat treatment to have alignment mark, crystallizing method for the semiconductor thin film, and crystallizing apparatus for the semiconductor thin film (2012-05-22),

3. 7964036 - Crystallization apparatus and crystallization method (2011-06-21),

4. 7964035 - Crystallization apparatus and crystallization method (2011-06-21),

5. 7803520 - Crystallization apparatus, crystallization method, device and phase modulation element (2010-09-28),

6. 7499147 - Generation method of light intensity distribution, generation apparatus of light intensity distribution, and light modulation element assembly (2009-03-03),

7. 7405141 - Processing method, processing apparatus, crystallization method and crystallization apparatus using pulsed laser beam (2008-07-29),

8. 7318865 - Crystallization apparatus and method; manufacturing method of electronic device, electronic device, and optical modulation element (2008-01-15),

9. 7247813 - Crystallization apparatus using pulsed laser beam (2007-07-24),

10. 7214270 - Crystallization apparatus, crystallization method, device and phase modulation element (2007-05-08),

11. 7157677 - Method of picking up sectional image of laser light (2007-01-02),

12. 6268582 - ECR plasma CVD apparatus (2001-07-31),

13. 6223686 - Apparatus for forming a thin film by plasma chemical vapor deposition (2001-05-01),

14. 6089185 - Thin film forming apparatus (2000-07-18),

15. 6060131 - Method of forming a thin film by plasma chemical vapor deposition (2000-05-09),

Title: Noritaka Akita - Innovative Inventor from Hiratsuka

Introduction: Noritaka Akita is a renowned inventor hailing from Hiratsuka, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Noritaka Akita holds several patents in the areas of robotics, artificial intelligence, and renewable energy, showcasing his diverse range of expertise and forward-thinking approach to problem-solving.

Career Highlights: With over two decades of experience in the tech industry, Noritaka Akita has worked with leading companies to develop cutting-edge solutions that have revolutionized various sectors. His innovative mindset and dedication to excellence have earned him a reputation as a visionary inventor.

Collaborations: Throughout his career, Noritaka Akita has collaborated with top researchers, engineers, and scientists to bring his ideas to life. His ability to work effectively in multidisciplinary teams has led to the successful implementation of numerous projects that have had a significant impact on the industry.

Conclusion: Noritaka Akita's passion for innovation and his relentless pursuit of excellence continue to drive him to push the boundaries of what is possible. His contributions to the world of technology have left a lasting legacy and inspired the next generation of inventors to think boldly and creatively.

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