The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2008
Filed:
Feb. 27, 2007
Masayuki Jyumonji, Yokohama, JP;
Hiroyuki Ogawa, Nara, JP;
Masato Hiramatsu, Tokyo, JP;
Noritaka Akita, Hiratsuka, JP;
Tomoya Kato, Yokohama, JP;
Masayuki Jyumonji, Yokohama, JP;
Hiroyuki Ogawa, Nara, JP;
Masato Hiramatsu, Tokyo, JP;
Noritaka Akita, Hiratsuka, JP;
Tomoya Kato, Yokohama, JP;
Advanced LCD Technologies Development Center Co., Ltd., Yokohama-shi, JP;
Abstract
In a laser processing method and a laser processing apparatus which irradiate a processing target body with a laser beam pulse-oscillated from a laser beam source, a processing state is monitored by a photodetector, and the laser beam source is again subjected to oscillation control on the moment when erroneous laser irradiation is detected, thereby performing laser processing. Further, in a laser crystallization method and a laser crystallization apparatus using a pulse-oscillated excimer laser, a homogenizing optical system, an optical element and a half mirror are arranged in an optical path, light from the half mirror is detected by a photodetector, and a light intensity insufficient irradiation position is again irradiated with a laser beam to perform crystallization when the detection value does not fall within a range of a predetermined specified value.