Norimitsu Morioka

Title: Norimitsu Morioka: A Pioneer in Developing Substrate Technologies

Introduction

Norimitsu Morioka is an innovative inventor based in Kumamoto, Japan. With a remarkable portfolio of three patents, he has made significant contributions to the field of substrate development, particularly in photoresist technology. His inventions demonstrate a blend of creativity and technical proficiency that addresses complex challenges in the manufacturing process.

Latest Patents

Morioka's latest patents focus on advanced apparatuses and methods for developing resist-coated substrates. One notable invention is an apparatus that features a spin chuck designed with a supporting surface smaller than the substrate. This apparatus allows for spin-driven development with the photoresist-coated surface held upward. It incorporates several key components, including:

- A cup surrounding the spin chuck,

- A developing solution nozzle specifically for applying a developing solution to the photoresist-coated substrate,

- Two washing solution nozzles that ensure thorough cleaning of both the coated and rear surfaces of the substrate,

- A liquid seal ring mounted coaxially with the spin chuck to enhance the developing process,

- A liquid film forming section designed to create a clearance relative to the peripheral edge of the substrate, with carefully engineered wall portions to optimize the application of solutions.

His innovative designs improve the efficiency and effectiveness of substrate processing in semiconductor manufacturing.

Career Highlights

Morioka's career includes valuable experience at leading companies in the semiconductor industry. He worked at Tokyo Electron Limited and Tokyo Electron Kyushu Limited, where he honed his skills in developing cutting-edge technologies. His professional journey reflects a commitment to advancing the tools and methodologies essential for modern microfabrication.

Collaborations

Throughout his career, Morioka has collaborated with talented individuals, including co-workers such as Hideya Tanaka and Kosuke Yoshihara. These collaborative efforts have likely played a crucial role in furthering his innovative projects and ensuring that his inventions meet the demands of the industry.

Conclusion

Norimitsu Morioka stands out as a significant figure in the development of substrate processing technology. His patents serve as a testament to his inventive spirit and dedication to engineering excellence. As the field continues to evolve, the impact of his contributions will undoubtedly resonate within the semiconductor manufacturing space, inspiring future innovations.