Tokyo, Japan

Norimichi Anazawa

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 47(Granted Patents)


Location History:

  • Shinjuku-ku, JP (2004)
  • Tokyo, JP (1984 - 2008)

Company Filing History:


Years Active: 1984-2008

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4 patents (USPTO):Explore Patents

Title: Norimichi Anazawa: Innovator in Measurement and Charged Particle Beam Technology

Introduction

Norimichi Anazawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of measurement technology and charged particle beam apparatus. With a total of 4 patents to his name, Anazawa's work has had a considerable impact on the industry.

Latest Patents

One of Anazawa's latest patents is a method of deciding the quality of the measurement value by the edge width. This innovative method involves acquiring the signal intensity distribution of a pattern on an object to be measured. It detects the edge positions of the pattern and the taper widths of the edge parts, allowing for the automatic decision of defective measurements attributed to unclear images. Another notable patent is for a charged particle beam apparatus and a contamination removal method. This apparatus includes a preparatory evacuation chamber and an ultraviolet irradiation unit that removes contamination from the surface of the sample before it is conveyed into the sample chamber.

Career Highlights

Throughout his career, Anazawa has worked with notable companies such as Holon Co., Ltd. and Jeol Ltd. His expertise in measurement technology and charged particle beam systems has positioned him as a key figure in these organizations.

Collaborations

Anazawa has collaborated with esteemed colleagues, including Jun Nitta and Minoru Ito. These partnerships have further enhanced his innovative contributions to the field.

Conclusion

Norimichi Anazawa's work exemplifies the spirit of innovation in measurement and charged particle beam technology. His patents reflect a commitment to advancing these fields and improving measurement accuracy.

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