The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2008

Filed:

Dec. 05, 2005
Applicants:

Akira Yonezawa, Tokyo, JP;

Tatenori Jinriki, Tokyo, JP;

Jun Nitta, Tokyo, JP;

Norimichi Anazawa, Tokyo, JP;

Ryuichi Shimizu, Osaka, JP;

Inventors:

Akira Yonezawa, Tokyo, JP;

Tatenori Jinriki, Tokyo, JP;

Jun Nitta, Tokyo, JP;

Norimichi Anazawa, Tokyo, JP;

Ryuichi Shimizu, Osaka, JP;

Assignee:

Holon Co., Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); G21K 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A charged particle beam apparatus comprising a preparatory evacuation chamber (in FIG.A) into which a sample () is conveyed and which is preliminarily evacuated, an ultraviolet irradiation unit () which is disposed in the preparatory evacuation chamber () and which irradiates the surface of the sample () conveyed into the preparatory evacuation chamber (), with ultraviolet rays for a predetermined time period, and a sample chamber () into which the sample () is conveyed in the preliminarily evacuated state of the preparatory evacuation chamber () or from which the sample () is conveyed into the preparatory evacuation chamber (), wherein the ultraviolet irradiation of the sample () by the ultraviolet irradiation unit () is performed before the conveyance of the sample () into the sample chamber (), or/and after the conveyance thereof from the sample chamber (), thereby to remove contamination on the surface of the sample ().


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