Norikiyo Nakagawa

Title: Norikiyo Nakagawa: Innovator in Photosensitive Resin Technology

Introduction

Norikiyo Nakagawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 5 patents. His work has been instrumental in advancing the methods used in relief printing plates.

Latest Patents

Among his latest patents, Nakagawa has developed an ablation layer for a photosensitive resin used in relief printing plates. This ablation layer contains at least an acid-modified polymer and an infrared-absorbing agent. It is characterized by a layer acid value ranging from 2 mg KOH/g to 400 mg KOH/g, and a neutralized salt ratio of 0.9 or less. The layer acid value is calculated based on the acid value of the acid-modified polymer and its mass ratio to the entire ablation layer. The neutralized salt ratio is determined by the number of moles of polymer in a neutralized salt state compared to the total number of moles of the acid-modified polymer.

Career Highlights

Throughout his career, Nakagawa has worked with notable companies such as Asahi Kasei E-Materials Corporation and Asahi Kasei Kabushiki Kaisha. His experience in these organizations has allowed him to refine his expertise in materials science and resin technology.

Collaborations

Some of his coworkers include Takuto Nakata and Yoshimichi Mitamura. Their collaboration has contributed to the innovative developments in the field of photosensitive resins.

Conclusion

Norikiyo Nakagawa's contributions to the field of photosensitive resin technology have established him as a key figure in the industry. His innovative patents and collaborations continue to influence advancements in relief printing technology.