The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2015

Filed:

Jun. 27, 2012
Applicants:

Takuto Nakata, Tokyo, JP;

Norikiyo Nakagawa, Tokyo, JP;

Inventors:

Takuto Nakata, Tokyo, JP;

Norikiyo Nakagawa, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C23F 1/16 (2006.01); C09K 13/06 (2006.01); H01L 21/3213 (2006.01); H01L 21/033 (2006.01); C09K 13/00 (2006.01); G03F 7/004 (2006.01); G03F 7/32 (2006.01); C23F 1/18 (2006.01);
U.S. Cl.
CPC ...
C23F 1/16 (2013.01); C09K 13/00 (2013.01); C09K 13/06 (2013.01); G03F 7/0043 (2013.01); G03F 7/32 (2013.01); H01L 21/0337 (2013.01); H01L 21/32134 (2013.01); C23F 1/18 (2013.01);
Abstract

To provide an etchant for copper oxide, control of the etching rate, and etching method using the same for enabling exposed portions to be selectively etched against unexposed portions in the case of performing exposure with laser light using an oxide of copper as a heat-reactive resist material, an etchant of the invention is an etchant for copper oxide to selectively remove a copper oxide of a particular valence from a copper oxide-containing layer containing copper oxides of different valences, and is characterized by containing at least an amino acid, a chelating agent and water, where a weight percentage of the amino acid is higher than that of the chelating agent, and pH thereof is 3.5 or more.


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