Location History:
- Shiroyama-Machi, JP (1999)
- Tokyo, JP (2007 - 2010)
- Kofu, JP (2009 - 2011)
Company Filing History:
Years Active: 1999-2011
Title: Norifumi Kimura: Innovator in Semiconductor Technology
Introduction
Norifumi Kimura is a prominent inventor based in Kofu, Japan, known for his significant contributions to semiconductor technology. With a total of 7 patents, Kimura has developed innovative methods and apparatuses that enhance the efficiency and effectiveness of semiconductor processes.
Latest Patents
One of Kimura's latest patents is a method for using a film formation apparatus in semiconductor processes. This method involves determining process conditions for a film formation process, including a preset film thickness for a thin film on a target substrate. Additionally, it establishes a timing for a cleaning process based on the cumulative film thickness of the thin film. The cleaning process is performed after a specified number of film formation repetitions, ensuring optimal performance.
Another notable patent is a vertical CVD apparatus designed for forming silicon-germanium films. This apparatus processes multiple target substrates simultaneously and includes a reaction container with a process field for accommodating the substrates. It features a common supply system that delivers a mixture gas, consisting of silane and germane family gases, through supply ports positioned at various heights.
Career Highlights
Norifumi Kimura is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on advancing film formation technologies, which are crucial for the production of high-quality semiconductor devices.
Collaborations
Throughout his career, Kimura has collaborated with notable colleagues, including Takehiko Fujita and Masaki Kurokawa. These partnerships have contributed to the development of innovative solutions in semiconductor technology.
Conclusion
Norifumi Kimura's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor processes and apparatuses.