Norbert Mais

Title: Norbert Mais: Innovator in Semiconductor Technology

Introduction

Norbert Mais is a prominent inventor based in Munich, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on methods and structures that enhance the performance and reliability of semiconductor devices.

Latest Patents

Norbert's latest patents include innovative methods for forming layer structures and chip packages. One of his notable inventions is a method of forming a layer structure that involves plasma-treating a metal surface with a hydrogen-containing plasma. This process creates nucleophilic groups on the metal surface, allowing for the formation of an organic layer that is covalently bonded to these groups. Another significant patent addresses the barrier for power metallization in semiconductor devices. This invention includes a structured interlayer on a substrate and a structured power metallization that prevents the diffusion of various ions towards the metallization, ensuring the integrity and performance of the device.

Career Highlights

Norbert Mais is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has positioned him as a key player in advancing semiconductor technology. His innovative approaches have contributed to the development of more efficient and reliable semiconductor devices.

Collaborations

Norbert has collaborated with notable colleagues such as Johann Gatterbauer and Dirk Meinhold. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Norbert Mais is a distinguished inventor whose work in semiconductor technology has led to several important patents. His contributions continue to shape the future of the industry, making him a valuable asset to Infineon Technologies AG and the broader field of semiconductor innovation.