Nobuyuki Yasutake

This inventor holds 11 USPTO granted patents. Top assignees: Fujitsu Corporation, Adv Antest Corporation. Active years: 1986-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuyuki Yasutake. Retrieved from https://idiyas.com/inventor/nobuyuki-yasutake

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11

% Patents Active = 100.0

Average Co-Inventor Count = 2.2

ph-index = 7

Forward Citations = 101(Granted Patents)

Location History:

Yokohama, JP (1986 - 1987)
Tokyo, JP (1989 - 1994)
Kasugai, JP (1999)
Kawasaki, JP (1995 - 2000)

Company Filing History:

Adv Antest Corporation

patents

where one patent can have more than one assignee

Years Active: 1986-2000

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11 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6046459 - Method and system for charged particle beam exposure (2000-04-04),

2. 5981118 - Method for charged particle beam exposure with fixed barycenter through (1999-11-09),

3. 5917360 - Differential current-switch circuit, D/A conversion circuit and method (1999-06-29),

4. 5404018 - Method of and an apparatus for charged particle beam exposure (1995-04-04),

5. 5368613 - Electron beam exposure apparatus (1994-11-29),

6. 5223719 - Mask for use in a charged particle beam apparatus including beam passing (1993-06-29),

7. 5208560 - Signal transmission circuit (1993-05-04),

8. 5134398 - Digital-to-analog converter having a circuit for compensating for (1992-07-28),

9. 4853870 - Electron beam exposure system (1989-08-01),

10. 4651033 - Device for complementary input signals using two circuits with different (1987-03-17),

11. 4607333 - Electron beam exposure apparatus (1986-08-19),

Title: Nobuyuki Yasutake: Innovator in Charged Particle Beam Technology

Introduction

Nobuyuki Yasutake is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of charged particle beam technology, holding a total of 11 patents. His innovative work has advanced the capabilities of exposure systems used in various applications.

Latest Patents

Yasutake's latest patents include a method and system for charged particle beam exposure. This invention utilizes a scanning stage where multiple wafers are mounted through wafer holders. The system incorporates a balancing stage that ensures the barycenter remains fixed during operation. By measuring the positions of reflecting mirrors and calculating deviations from target positions, the technology allows for precise corrections using deflectors. This method enhances the accuracy and efficiency of charged particle beam exposure processes.

Career Highlights

Throughout his career, Yasutake has worked with notable companies such as Fujitsu Corporation and Advantest Corporation. His experience in these organizations has contributed to his expertise in developing advanced technologies in the semiconductor industry.

Collaborations

Yasutake has collaborated with esteemed colleagues, including Yasushi Takahashi and Hiroshi Yasuda. Their combined efforts have fostered innovation and progress in their respective fields.

Conclusion

Nobuyuki Yasutake's contributions to charged particle beam technology exemplify his dedication to innovation. His patents and collaborations reflect a commitment to advancing the industry and enhancing technological capabilities.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]