Kyoto, Japan

Nobuyuki Inoue


Average Co-Inventor Count = 2.3

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Osaka, JP (2019)
  • Kyoto, JP (2019)
  • Hirakata, JP (2020)

Company Filing History:


Years Active: 2019-2020

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5 patents (USPTO):Explore Patents

Title: Nobuyuki Inoue: Innovator in Optical Measurement Technologies

Introduction

Nobuyuki Inoue is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of optical measurement technologies, holding a total of five patents. His work focuses on innovative methods and systems for measuring optical characteristics, which have applications in various industries.

Latest Patents

Inoue's latest patents include an "Optical Characteristics Measuring Method and Optical Characteristics Measuring System." This invention involves a method for measuring the optical characteristics of a subject by acquiring images using a displaceable image capturing apparatus. The method creates a virtual image of the subject from multiple analysis points. Another notable patent is the "Optical Measurement Apparatus and Optical Measurement Method." This apparatus features a probe that irradiates a sample with light and calculates distances and thicknesses based on reflected light, enhancing the precision of optical measurements.

Career Highlights

Nobuyuki Inoue is currently employed at Otsuka Electronics Co., Ltd., where he continues to develop cutting-edge optical measurement technologies. His expertise and innovative approach have positioned him as a key figure in the field.

Collaborations

Inoue has collaborated with notable colleagues, including Kunikazu Taguchi and Toshiki Shinke. Their combined efforts have contributed to advancements in optical measurement techniques.

Conclusion

Nobuyuki Inoue's work in optical measurement technologies exemplifies innovation and dedication to advancing the field. His patents reflect a commitment to improving measurement methods, which can have a lasting impact on various applications.

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