Yamato, Japan

Nobutoshi Mizusawa

This inventor holds 43 USPTO granted patents, primarily in X-Ray Exposure Technology. Top assignee: Canon Kabushiki Kaisha. Active years: 1987-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobutoshi Mizusawa. Retrieved from https://idiyas.com/inventor/nobutoshi-mizusawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 19

Forward Citations = 963(Granted Patents)


Location History:

  • Yokohama, JP (1987)
  • Tokyo, JP (1988)
  • Sagamihara, JP (1989 - 1990)
  • Yamato, JP (1990 - 2000)

Company Filing History:


Years Active: 1987-2000

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Areas of Expertise:
Exposure Apparatus
Substrate Holding Device
X-Ray Mask
Alignment Apparatus
Ink Cartridge
Temperature Control
Conveying Device
Ink-Jet Recording
Mask Supporting Mechanism
Exposure Control
Photoelectron Beam
Composite Materials
43 patents (USPTO):Explore Patents

Title: Nobutoshi Mizusawa: Pioneering Inventor from Yamato, Japan

Introduction: Nobutoshi Mizusawa is a renowned inventor hailing from Yamato, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Mizusawa holds several patents in various technological domains, including robotics, artificial intelligence, and renewable energy solutions.

Career Highlights: With a career spanning over two decades, Mizusawa has worked with leading tech companies in Japan, spearheading research and development projects that have led to significant advancements in the industry.

Collaborations: Throughout his career, Mizusawa has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge sharing.

Conclusion: Nobutoshi Mizusawa's dedication to pushing the boundaries of technology and his passion for innovation continue to inspire the next generation of inventors and researchers worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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