The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 1998
Filed:
Jun. 05, 1995
Shunichi Uzawa, Tokyo, JP;
Takao Kariya, Hino, JP;
Makoto Higomura, Yokohama, JP;
Nobutoshi Mizusawa, Yamato, JP;
Ryuichi Ebinuma, Kawasaki, JP;
Kohji Uda, Yokohama, JP;
Kunitaka Ozawa, Isehara, JP;
Mitsuaki Amemiya, Atsugi, JP;
Eiji Sakamoto, Sagamihara, JP;
Naoto Abe, Isehara, JP;
Kenji Saitoh, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A synchrotron exposure includes a synchrotron radiation source for generating a synchrotron radiation beam, and exposure unit having a mask stage for holding a mask and a wafer stage for holding a waver, a beam port for directing the radiation beam to the exposure unit, a mirror unit having a mirror for reflecting the radiation beam, a pre-alignment system for aligning the wafer relative to the wafer stage, a fine-alignment system for aligning the wafer held by the wafer stage relative to the mask held by the mask stage, a mask storage apparatus for storing the mask, a wafer storage apparatus for storing the wafer, a mask conveying apparatus for conveying the mask between the mask storage apparatus and the mask stage and a wafer conveying apparatus for conveying a wafer between the wafer storage apparatus and the wafer stage.